Tuning transport across MoS2/graphene interfaces via as-grown lateral heterostructures
- Pennsylvania State Univ., University Park, PA (United States); Pennsylvania State Univ., University Park, PA (United States). Center for 2-Dimensional and Layered Materials
- Univ. of Pittsburgh, PA (United States)
- Pennsylvania State Univ., University Park, PA (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS); Univ. Wurzburg (Germany)
- Pennsylvania State Univ., University Park, PA (United States); Pennsylvania State Univ., University Park, PA (United States). Center for 2-Dimensional and Layered Materials; Pennsylvania State Univ., University Park, PA (United States). Center for Atomically thin Multifunctional Coatings
An unexploited property of graphene-based heterojunctions is the tunable doping of the junction via electrostatic gating. This unique property may be key in advancing electronic transport across interfaces with semiconductors. Here, we engineer transport in semiconducting TMDs by constructing a lateral heterostructure with epitaxial graphene and tuning its intrinsic doping to form a p–n junction between the graphene and the semiconducting TMDs. Graphene grown on SiC (epitaxial graphene) is intrinsically doped via substrate polarization without the introduction of an external dopant, thus enabling a platform for pristine heterostructures with a target band alignment. We demonstrate an electrostatically tunable graphene/MoS2p–n junction with >20× reduction and >10× increased tunability in contact resistance (Rc) compared with metal/TMD junctions, attributed to band alignment engineering and the tunable density of states in graphene. This unique concept provides improved control over transport across 2D p–n junctions.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC); National Science Foundation (NSF); Swiss National Science Foundation
- Grant/Contract Number:
- AC02-05CH11231
- OSTI ID:
- 1760261
- Journal Information:
- npj 2D Materials and Applications, Journal Name: npj 2D Materials and Applications Journal Issue: 1 Vol. 4; ISSN 2397-7132
- Publisher:
- Springer NatureCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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