In situ TEM study of crystallization and chemical changes in an oxidized uncapped Ge2Sb2Te5 film
- Univ. of Connecticut, Storrs, CT (United States)
- Gatan Inc., Pleasanton, CA (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Univ. of Connecticut, Storrs, CT (United States); Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
- Univ. of Manchester (United Kingdom)
- Univ. of Connecticut, Storrs, CT (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Ge2Sb2Te5 (GST-225) has been the most used active material in nonvolatile phase-change memory devices. Understanding the kinetics and dynamics involved in crystallization is critical for the optimization of materials and devices. A GST-225 thin film of 20 nm thickness was prepared by sputtering directly onto a Protochip and left uncapped and exposed to atmosphere for approximately 1 year. Here, early stages of crystallization and growth of the film have been studied inside the TEM from room temperature to 140 °C. The morphological and structural transformations have been studied by a Cs-corrected environmental TEM, and images have been recorded using a high-speed low electron dose camera (Gatan K3 IS). The amorphous to crystalline transformation has been observed at ~35 °C. From the large field, high-resolution images obtained using the Gatan K3 IS camera early crystallization can be detected and nucleation rates and growth velocities can be obtained.
- Research Organization:
- Pacific Northwest National Laboratory (PNNL), Richland, WA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC); USDOE National Nuclear Security Administration (NNSA); National Science Foundation (NSF)
- Grant/Contract Number:
- AC05-76RL01830; NA0003525; 89233218CNA000001
- OSTI ID:
- 1735998
- Alternate ID(s):
- OSTI ID: 1766999
OSTI ID: 1782581
- Report Number(s):
- PNNL-SA--156726
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 128; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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