A native oxide high-κ gate dielectric for two-dimensional electronics
Journal Article
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· Nature Electronics
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- Peking Univ., Beijing (China); University of Texas at Austin
- Peking Univ., Beijing (China)
- Weizmann Inst. of Science, Rehovot (Israel)
- Univ. of Texas, Austin, TX (United States)
- Tsinghua Univ., Beijing (China)
- Peking Univ., Beijing (China); Nankai Univ., Tianjin (China)
- Peking Univ., Beijing (China); Collaborative Innovation Center of Quantum Matter, Beijing (China)
Silicon-based transistors are approaching their physical limits and thus new high-mobility semiconductors are sought to replace silicon in the microelectronics industry. Both bulk materials (such as silicon-germanium and III–V semiconductors) and low-dimensional nanomaterials (such as one-dimensional carbon nanotubes and two-dimensional transition metal dichalcogenides) have been explored, but, unlike silicon, which uses silicon dioxide (SiO2) as its gate dielectric, these materials suffer from the absence of a high-quality native oxide as a dielectric counterpart. This can lead to compatibility problems in practical devices. Here, we show that an atomically thin gate dielectric of bismuth selenite (Bi2SeO5) can be conformally formed via layer-by-layer oxidization of an underlying high-mobility two-dimensional semiconductor, Bi2O2Se. Using this native oxide dielectric, high-performance Bi2O2Se field-effect transistors can be created, as well as inverter circuits that exhibit a large voltage gain (as high as 150). The high dielectric constant (~21) of Bi2SeO5 allows its equivalent oxide thickness to be reduced to 0.9 nm while maintaining a gate leakage lower than thermal SiO2. The Bi2SeO5 can also be selectively etched away by a wet chemical method that leaves the mobility of the underlying Bi2O2Se semiconductor almost unchanged.
- Research Organization:
- Univ. of Texas, Austin, TX (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0019025
- OSTI ID:
- 1658820
- Journal Information:
- Nature Electronics, Journal Name: Nature Electronics Journal Issue: 8 Vol. 3; ISSN 2520-1131
- Publisher:
- Springer NatureCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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