Anodic arc discharge: Why pulsed?

Corbella, Carles; Portal, Sabine; Kundrapu, Madhusudhan N.; Keidar, Michael

doi:10.1063/5.0002872

Anodic arc discharge: Why pulsed?

Journal Article · Mon May 11 00:00:00 EDT 2020 · Physics of Plasmas

DOI:https://doi.org/10.1063/5.0002872· OSTI ID:1638718

^[1]; Portal, Sabine ^[2]; Kundrapu, Madhusudhan N. ^[3]; Keidar, Michael ^[2]

George Washington University, Washington, DC (United States); Tech-X Corporation
George Washington University, Washington, DC (United States)
Tech-X Corporation, Boulder, CO (United States)

Pulsed anodic arc discharge is a novel synthesis method of nanomaterials by means of low-temperature atmospheric plasma. The technique consists in periodically supplying DC power to two vertically aligned electrodes in the form of short unipolar pulses with peak currents of a few hundred Amperes in helium atmosphere. The pulsed arc plasmas are sustained at frequencies of the order of 1 Hz with around 10% of duty cycle. It constitutes a versatile technique thanks to a series of advantages compared to continuous DC arc processes, in particular: flexibility in the experimental conditions, process stability and repeatability, better utilization of ablating anode material, lower production of macroparticles, and lower thermal loads. Such features are discussed in this article. A brief overview concerning the recent accomplishments of pulsed arc discharge on deposition of carbon nanostructures (graphene and carbon nanotubes) and few-layer flakes of molybdenum disulphide (MoS₂) is provided, as well as an outlook on future applications of this method for the discovery of new materials with tailored functional properties.

View Accepted Manuscript (DOE)

Research Organization:: Tech-X Corporation, Boulder, CO (United States); George Washington University, Washington, DC (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Fusion Energy Sciences (FES); National Science Foundation

Grant/Contract Number:: SC0015767

OSTI ID:: 1638718

Alternate ID(s):: OSTI ID: 1617989

Journal Information:: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 5 Vol. 27; ISSN 1070-664X

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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