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Massive Suppression of Proximity Pairing in Topological ( Bi1-x Sbx ) 2 Te3 Films on Niobium

Journal Article · · Physical Review Letters
 [1];  [2];  [3];  [2];  [2];  [2];  [2];  [2];  [3];  [4];  [5];  [3];  [6];  [7];  [3];  [2];  [2];  [3]
  1. Univ. of Illinois at Urbana-Champaign, IL (United States); University of Illinois at Urbana-Champaign
  2. Univ. of Tokyo (Japan)
  3. Univ. of Illinois at Urbana-Champaign, IL (United States)
  4. Univ. of Illinois at Urbana-Champaign, IL (United States); Shanghai Jiao Tong Univ. (China)
  5. Univ. of Illinois at Urbana-Champaign, IL (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  6. Univ. of Münster (Germany)
  7. Univ. Paris-Saclay, Gif-sur-Yvette (France); Synchrotron SOLEIL, Paris (France)
Interfacing bulk conducting topological Bi2Se3 films with s-wave superconductors initiates strong superconducting order in the nontrivial surface states. Yet, bulk insulating topological (Bi1-xSbx)2Te3 films on bulk Nb instead exhibit a giant attenuation of surface superconductivity, even for films only two-layers thick. This massive suppression of proximity pairing is shown by ultrahigh-resolution band mappings and by contrasting quantified superconducting gaps with those of heavily n-doped topological Bi2Se3/Nb. The results underscore the limitations of using superconducting proximity effects to realize topological superconductivity in nearly intrinsic systems.
Research Organization:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Organization:
Army Research Office (ARO); French National Research Agency (ANR); National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Materials Sciences & Engineering Division
Grant/Contract Number:
FG02-07ER46383
OSTI ID:
1633111
Journal Information:
Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 23 Vol. 124; ISSN 0031-9007; ISSN PRLTAO
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English

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