Implementation of Talbot–Lau x-ray deflectometry in the pulsed power environment using a copper X-pinch backlighter
Journal Article
·
· Journal of Applied Physics
- Pontificia Universidad Católica de Chile, Santiago (Chile); Johns Hopkins University
- Johns Hopkins Univ., Baltimore, MD (United States)
- Pontificia Universidad Católica de Chile, Santiago (Chile)
A Talbot–Lau x-ray deflectometer can map electron density gradients in high energy density plasmas, as well as provide information about plasma elemental composition through single-image x-ray refraction and attenuation measurements. A new adaptation to a pulsed power environment used backlighting from copper X-pinches, allowing for electron density mapping of a low-Z object. Even though the X-pinch backlighter is not properly optimized for emitting x-rays in terms of source size and photon fluence, Moire fringe patterns with contrast up to 14% and fringe shift due to refraction on a beryllium object are obtained. Due to the proximity of the deflectometer with the X-pinch (~6 cm), it is shown that a protective filter is required to avoid damage in the closest (i.e., source) grating due to both plasma debris and mechanical shock. Regarding grating survival, these did not show any damage due to the intense magnetic field or heating induced by plasma radiation. Electron density on beryllium was measured with a difference lower than 16%. The areal electron density mapping of the sample was limited by source size characteristics, in similarity to transmission radiography. These results show the potential of plasma electron density as well as material mapping through Talbot–Lau x-ray deflectometry in a pulsed power environment.
- Research Organization:
- Johns Hopkins Univ., Baltimore, MD (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); Comisión Nacional de Investigación Científica y Tecnológica (CONICYT); National Fund for Scientific and Technological Development (FONDECYT)
- Grant/Contract Number:
- NA0003882; NA0002955
- OSTI ID:
- 1631998
- Alternate ID(s):
- OSTI ID: 1630457
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 20 Vol. 127; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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