Electromagnetic fields in a low-pressure planar inductively coupled plasma source
- Univ. of Wisconsin, Madison, WI (United States). Engineering Research Center for Plasma-Aided Manufacturing
The results of experimental and theoretical studies of electromagnetic fields in a planar radio-frequency (13.56 MHz) Inductively-Coupled Plasma (ICP) source are compared. Experimental measurements have been performed using inductive loop probes oriented to measure the time derivatives of the axial and radial components of the magnetic field. The measurements of {dot B}{sub z} were used to calculate the azimuthal component of the inductive electric field E{sub {phi}} directly from Faraday`s law, taking advantage of cylindrical symmetry. Using {dot B}{sub z} rather than {dot B}{sub r}, allows calculation of E{sub {phi}} without any approximations or knowledge of plasma parameters, and as such should give a more accurate estimate of E{sub {phi}}. In order to investigate the degree of electromagnetic field shielding by the plasma, measurements were taken with argon plasma, in the range of operating pressures between 5 and 50 mTorr and rf power between 50 and 500 Watt, as well as without the plasma. Experimental results are compared with numerical calculations of fields under conditions of nonlocality of the electron spectrum. The influence of the spatial dispersion of the plasma conductivity on the field shielding at low pressures, when collisionless electron heating predominates is discussed.
- OSTI ID:
- 163092
- Report Number(s):
- CONF-950612-; ISBN 0-7803-2669-5; TRN: IM9604%%196
- Resource Relation:
- Conference: 22. international conference on plasma science, Madison, WI (United States), 5-8 Jun 1995; Other Information: PBD: 1995; Related Information: Is Part Of IEEE conference record -- abstracts: 1995 IEEE international conference on plasma science; PB: 312 p.
- Country of Publication:
- United States
- Language:
- English
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