Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium

Peshl, Jeremy; McNeill, Roderick; Sukenik, Charles I.; Nikolić, Milka; Popović, Svetozar; Vŭsković, Leposava

doi:10.1063/1.5115043

Title: Argon metastable and resonant level densities in Ar and Ar/Cl₂ discharges used for the processing of bulk niobium

Journal Article · Mon Sep 09 00:00:00 EDT 2019 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.5115043· OSTI ID:1612167

^[1];

^[2];

^[1]; Vŭsković, Leposava ^[1]

Old Dominion Univ., Norfolk, VA (United States)
Department of Physics and Astronomy, University of San Francisco, San Francisco, California 94117, USA

In this work, a comparative analysis of two popular spectroscopy techniques is conducted in a coaxial cylindrical capacitively coupled discharge designed for the plasma processing of superconducting radio frequency (SRF) cavities. The density of the metastable and resonant levels in Ar is measured in both Ar and Ar/Cl₂ discharges to properly characterize the unique discharge system and aid in the development of a cavity etching routine. The first method, deemed the “branching fraction method,” utilizes the sensitivity of photon reabsorption of radiative decay to measure the lower state (metastable and resonant) densities by taking ratios of spectral lines with a common upper level. This method has been gaining popularity as it does not require any a priori knowledge about the electron energy distribution. The second method is a tunable diode laser absorption spectroscopy technique that measures the thermal Doppler broadening of spectral lines, from which the neutral gas temperature and lower state density of the transition can be evaluated. The two methods were conducted in tandem, while external parameters that were empirically determined to be important to the etching mechanism of SRF cavities are varied. Relationships between the excited state densities and the external parameters are presented for both spectroscopy methods and conclusions about the effects of these parameters on the discharge are stated when appropriate.

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Research Organization:: Old Dominion Univ., Norfolk, VA (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: SC0014397

OSTI ID:: 1612167

Journal Information:: Journal of Applied Physics, Vol. 126, Issue 10; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 1 work

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Title: Argon metastable and resonant level densities in Ar and Ar/Cl2 discharges used for the processing of bulk niobium

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Title: Argon metastable and resonant level densities in Ar and Ar/Cl₂ discharges used for the processing of bulk niobium