Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers

Harthcock, Colin; Qiu, S. Roger; Mirkarimi, Paul B.; Negres, Raluca A.; Guss, Gabe; Menor, Marlon G.; Bhowmik, Gourav; Huang, Mengbing

doi:10.1364/OME.389416

Title: Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers

Journal Article · Fri Mar 13 00:00:00 EDT 2020 · Optical Materials Express

DOI:https://doi.org/10.1364/OME.389416· OSTI ID:1604518

Harthcock, Colin; Qiu, S. Roger; Mirkarimi, Paul B.;

; Guss, Gabe; Menor, Marlon G.; Bhowmik, Gourav; Huang, Mengbing

Understanding the origin of laser damage-prone precursors in high index materials such as hafnia holds the key to the development of laser damage-resistant multilayer dielectric coated optics for high power and energy laser systems. In this study, we investigate the source of sub-stoichiometry, a potent laser damage precursor, in hafnia films produced by an ion beam sputtering (IBS) deposition method and the effect of such defects on the film performance upon ns ultraviolet (UV) laser (8 ns, 355 nm) exposure. Chemical analysis of data obtained via Rutherford backscattering spectroscopy (RBS) suggests that hafnia films deposited at two different planetary locations from the same deposition run exhibit anisotropic and location-dependent stoichiometries. While the oxygen-to-hafnium ratio is at the stoichiometric value of 2 for the hafnia film at the edge location, the ratio is significantly deviated and is 1.7 for that deposited at the planetary center. The sub-stoichiometric hafnia films display a much lower 1-on-1 damage onset at 1.6 ± 0.2 J/cm² compared to 2.3 ± 0.2 J/cm² in a stoichiometric film. The low damage performance films also have an over three times higher damage density at fluences above initiation. Coupled with Monte Carlo simulations, we reveal that sub-stoichiometry is primarily attributed to preferential removal of oxygen during film deposition by the bombardment of energetic reflected argon neutrals. The resulting oxygen deficiencies create the sub-bandgap states which facilitate the strong laser energy coupling and reduce the resistance to laser-induced damage in the hafnia single layer films.

View Journal Article

Cite

Export

Save

Research Organization:: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC52-07NA27344

OSTI ID:: 1604518

Alternate ID(s):: OSTI ID: 1605530

Report Number(s):: LLNL-JRNL-790581

Journal Information:: Optical Materials Express, Journal Name: Optical Materials Express Vol. 10 Journal Issue: 4; ISSN 2159-3930

Publisher:: Optical Society of America (OSA)Copyright Statement

Country of Publication:: United States

Language:: English

Citation Metrics:

Cited by: 7 works

Citation information provided by
Web of Science

References (41)

Stress compensation in hafnia/silica optical coatings by inclusion of alumina layers Oliver, J. B.; Kupinski, P.; Rigatti, A. L. Optics Express, Vol. 20, Issue 15 https://doi.org/10.1364/OE.20.016596	journal	January 2012
The impact of nano-bubbles on the laser performance of hafnia films deposited by oxygen assisted ion beam sputtering method Harthcock, C.; Qiu, S. R.; Negres, R. A. Applied Physics Letters, Vol. 115, Issue 25 https://doi.org/10.1063/1.5129454	journal	December 2019
Near-ultraviolet absorption and nanosecond-pulse-laser damage in HfO ₂ monolayers studied by submicrometer-resolution photothermal heterodyne imaging and atomic force microscopy Papernov, S.; Tait, A.; Bittle, W. Journal of Applied Physics, Vol. 109, Issue 11 https://doi.org/10.1063/1.3594713	journal	June 2011
Properties of HfO2 thin films prepared by dual-ion-beam reactive sputtering Zhang, Dongping; Fan, Ping; Wang, Congjuan Optics & Laser Technology, Vol. 41, Issue 6 https://doi.org/10.1016/j.optlastec.2008.11.010	journal	September 2009
Vacancy and interstitial defects in hafnia Foster, A. S.; Lopez Gejo, F.; Shluger, A. L. Physical Review B, Vol. 65, Issue 17 https://doi.org/10.1103/PhysRevB.65.174117	journal	May 2002
Assessing hafnium on hafnia as an oxygen getter O'Hara, Andrew; Bersuker, Gennadi; Demkov, Alexander A. Journal of Applied Physics, Vol. 115, Issue 18 https://doi.org/10.1063/1.4876262	journal	May 2014
Electronic properties of hafnium oxide: A contribution from defects and traps Gritsenko, Vladimir A.; Perevalov, Timofey V.; Islamov, Damir R. Physics Reports, Vol. 613 https://doi.org/10.1016/j.physrep.2015.11.002	journal	February 2016
Thermodynamics of the Vaporization of Hf and HfO ₂ : Dissociation Energy of HfO Panish, M. B.; Reif, Liane The Journal of Chemical Physics, Vol. 38, Issue 1 https://doi.org/10.1063/1.1733473	journal	January 1963
First principles study of the structural, electronic, and dielectric properties of amorphous HfO ₂ Chen, Tsung-Ju; Kuo, Chin-Lung Journal of Applied Physics, Vol. 110, Issue 6 https://doi.org/10.1063/1.3636362	journal	September 2011
Algorithms for the rapid simulation of Rutherford backscattering spectra Doolittle, Lawrence R. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 9, Issue 3 https://doi.org/10.1016/0168-583X(85)90762-1	journal	June 1985
Sputtering studies with the Monte Carlo Program TRIM.SP Biersack, J. P.; Eckstein, W. Applied Physics A Solids and Surfaces, Vol. 34, Issue 2 https://doi.org/10.1007/BF00614759	journal	June 1984
Sputtering yield calculations for neutral beam particle energies Haggmark, L. G.; Biersack, J. P. Journal of Nuclear Materials, Vol. 103 https://doi.org/10.1016/0022-3115(82)90621-3	journal	January 1981
Correlations between the oxygen deficiency and the laser damage resistance of different oxide films Xu, Cheng; Yi, Peng; Fan, Heliang Applied Surface Science, Vol. 289 https://doi.org/10.1016/j.apsusc.2013.10.121	journal	January 2014
Spectroscopic properties of oxygen vacancies in monoclinic $Hf O_{2}$ calculated with periodic and embedded cluster density functional theory Muñoz Ramo, D.; Gavartin, J. L.; Shluger, A. L. Physical Review B, Vol. 75, Issue 20 https://doi.org/10.1103/PhysRevB.75.205336	journal	May 2007
355nm absorption in HfO 2 and SiO 2 monolayers with embedded Hf nanoclusters studied using photothermal heterodyne imaging Papernov, S.; Shin, E.; Murray, T. SPIE Laser Damage, SPIE Proceedings https://doi.org/10.1117/12.981642	conference	December 2012
Laser damage resistance of hafnia thin films deposited by electron beam deposition, reactive low voltage ion plating, and dual ion beam sputtering Gallais, Laurent; Capoulade, Jérémie; Natoli, Jean-Yves Applied Optics, Vol. 47, Issue 13 https://doi.org/10.1364/AO.47.00C107	journal	November 2007
Equation of state of iron under core conditions of large rocky exoplanets Smith, Raymond F.; Fratanduono, Dayne E.; Braun, David G. Nature Astronomy, Vol. 2, Issue 6 https://doi.org/10.1038/s41550-018-0437-9	journal	April 2018
Electronic structure of oxygen vacancies in hafnium oxide Perevalov, T. V.; Aliev, V. Sh.; Gritsenko, V. A. Microelectronic Engineering, Vol. 109 https://doi.org/10.1016/j.mee.2013.03.005	journal	September 2013
Advances in ion beam sputtered Sc 2 O 3 for optical interference coatings Menoni, Carmen S.; Krous, Erik M.; Patel, Dinesh Laser Damage Symposium XLII: Annual Symposium on Optical Materials for High Power Lasers, SPIE Proceedings https://doi.org/10.1117/12.855604	conference	November 2010
Influence of oxygen vacancies on the electronic structure of $Hf O_{2}$ films Cho, Deok-Yong; Lee, Jae-Min; Oh, S. -J. Physical Review B, Vol. 76, Issue 16 https://doi.org/10.1103/PhysRevB.76.165411	journal	October 2007
Optical properties of oxygen vacancies in HfO ₂ thin films studied by absorption and luminescence spectroscopy Papernov, S.; Brunsman, M. D.; Oliver, J. B. Optics Express, Vol. 26, Issue 13 https://doi.org/10.1364/OE.26.017608	journal	January 2018
Oxygen defect induced photoluminescence of HfO2 thin films Ni, Jie; Zhou, Qin; Li, Zhengcao Applied Physics Letters, Vol. 93, Issue 1 https://doi.org/10.1063/1.2952288	journal	July 2008
Evaporation and ion assisted deposition of HfO[sub 2] coatings: Some key points for high power laser applications Andre, B.; Poupinet, L.; Ravel, G. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 18, Issue 5 https://doi.org/10.1116/1.1287153	journal	January 2000
Diamond at 800 GPa Bradley, D. K.; Eggert, J. H.; Smith, R. F. Physical Review Letters, Vol. 102, Issue 7 https://doi.org/10.1103/PhysRevLett.102.075503	journal	February 2009
Deposition of optical thin films by ion beam sputtering Varasi, Mauro; Misiano, Carlo; Lasaponara, Luigi Thin Solid Films, Vol. 117, Issue 3 https://doi.org/10.1016/0040-6090(84)90284-0	journal	July 1984
Ion-beam-assisted sputter deposition of thin oxide films Ektessabi, A. M. Surface and Coatings Technology, Vol. 68-69 https://doi.org/10.1016/0257-8972(94)90162-7	journal	December 1994
Study of luminescent defects in hafnia thin films made with different deposition techniques Ciapponi, Alessandra; Wagner, Frank R.; Palmier, Stéphanie Journal of Luminescence, Vol. 129, Issue 12 https://doi.org/10.1016/j.jlumin.2009.02.026	journal	December 2009
Anomalous Time-of-Flight Distributions Observed for Argon Implanted in Silicon and Resputtered by ${Ar}^{+}$ -Ion Bombardment van Veen, G. N. A.; Sanders, F. H. M.; Dieleman, J. Physical Review Letters, Vol. 57, Issue 6 https://doi.org/10.1103/PhysRevLett.57.739	journal	August 1986
Systematic investigations of low energy Ar ion beam sputtering of Si and Ag Feder, R.; Frost, F.; Neumann, H. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 317 https://doi.org/10.1016/j.nimb.2013.01.056	journal	December 2013
Ion beam sputtering of Ag – Angular and energetic distributions of sputtered and scattered particles Feder, René; Bundesmann, Carsten; Neumann, Horst Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 316 https://doi.org/10.1016/j.nimb.2013.09.007	journal	December 2013
Argon incorporation in Si(100) by ion bombardment at 15–100 eV Lau, W. M.; Bello, I.; Huang, L. J. Journal of Applied Physics, Vol. 74, Issue 12 https://doi.org/10.1063/1.355024	journal	December 1993
Influence of cleaning process on the laser-induced damage threshold of substrates Shen, Zhengxiang; Ding, Tao; Ye, Xiaowen Applied Optics, Vol. 50, Issue 9 https://doi.org/10.1364/AO.50.00C433	journal	January 2011
Argon solubility and diffusion in silica glass: Implications for the solution behavior of molecular gases Carroll, M. R.; Stolper, E. M. Geochimica et Cosmochimica Acta, Vol. 55, Issue 1 https://doi.org/10.1016/0016-7037(91)90412-X	journal	January 1991
Influence of absorption-edge properties on subpicosecond intrinsic laser-damage threshold at 1053 nm in hafnia and silica monolayers Chorel, M.; Papernov, S.; Kozlov, A. A. Optics Express, Vol. 27, Issue 12 https://doi.org/10.1364/OE.27.016922	journal	January 2019
Optimization of laser-damage resistance of evaporated hafnia films at 351nm Oliver, J. B.; Papernov, S.; Schmid, A. W. Boulder Damage Symposium XL Annual Symposium on Optical Materials for High Power Lasers, SPIE Proceedings https://doi.org/10.1117/12.805383	conference	December 2008
Plasma ion assisted deposition of hafnium dioxide using argon and xenon as process gases Stenzel, O.; Wilbrandt, S.; Yulin, S. Optical Materials Express, Vol. 1, Issue 2 https://doi.org/10.1364/OME.1.000278	journal	January 2011
Intrinsic resputtering—theory and experiment Hoffman, D. W. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 8, Issue 5 https://doi.org/10.1116/1.576483	journal	September 1990
HfO2 films with high laser damage threshold Alvisi, M.; Di Giulio, M.; Marrone, S. G. Thin Solid Films, Vol. 358, Issue 1-2 https://doi.org/10.1016/S0040-6090(99)00690-2	journal	January 2000
Structural and optical modification in hafnium oxide thin films related to the momentum parameter transferred by ion beam assistance Alvisi, M.; Scaglione, S.; Martelli, S. Thin Solid Films, Vol. 354, Issue 1-2 https://doi.org/10.1016/S0040-6090(99)00534-9	journal	October 1999
Superficial defects induced by argon and oxygen bombardments on (110) TiO2 surfaces Pétigny, S.; Mostéfa-Sba, H.; Domenichini, B. Surface Science, Vol. 410, Issue 2-3 https://doi.org/10.1016/S0039-6028(98)00297-0	journal	August 1998
Negative ion resputtering in Ta2Zn3O8 thin films Rack, Philip D.; Potter, Michael D.; Woodard, Andrew Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, Issue 5 https://doi.org/10.1116/1.581947	journal	September 1999

Similar Records

The impact of nano-bubbles on the laser performance of hafnia films deposited by oxygen assisted ion beam sputtering method

Journal Article · Mon Dec 16 00:00:00 EST 2019 · Applied Physics Letters · OSTI ID:1604518

Harthcock, C.; Qiu, S. R.; Negres, R. A.; +8 more

Optimization of Laser-Damage Resistance of Evaporated Hafnia Films at 351 nm

Journal Article · Tue Apr 07 00:00:00 EDT 2009 · Laser-Induced Damage in Optical Materials: 2008 · OSTI ID:1604518

Investigation of UV, ns-laser damage resistance of hafnia films produced by electron beam evaporation and ion beam sputtering deposition methods

Journal Article · Tue Jul 27 00:00:00 EDT 2021 · Journal of Applied Physics · OSTI ID:1604518

Peters, V. N.; Qiu, S. R.; Harthcock, C.; +7 more

Related Subjects

36 MATERIALS SCIENCE
Lasers

Title: Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers

Citation Formats

References (41)

Similar Records

Related Subjects