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Title: Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Journal Article · · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
DOI:https://doi.org/10.1116/1.4996553· OSTI ID:1541658
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  1. School of Chemical and Biomolecular Engineering Cornell University, Ithaca, New York 14853

Not provided.

Research Organization:
Cornell Univ., Ithaca, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0006647
OSTI ID:
1541658
Journal Information:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 35, Issue 6; ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English