Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Chen, Jiun-Ruey; Zhang, Wenyu; Nahm, Rambert K.; DiFeo, Michael A.; Engstrom, James R.

doi:10.1116/1.4996553

Title: Design and characterization of a microreactor for spatially confined atomic layer deposition and in situ UHV surface analysis

Journal Article · Wed Nov 01 00:00:00 EDT 2017 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.4996553· OSTI ID:1420472

Chen, Jiun-Ruey ^[1]; Zhang, Wenyu ^[1]; Nahm, Rambert K. ^[1]; DiFeo, Michael A. ^[1]; Engstrom, James R. ^[1]

School of Chemical and Biomolecular Engineering Cornell University, Ithaca, New York 14853

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Sponsoring Organization:: USDOE

Grant/Contract Number:: DESC0006647

OSTI ID:: 1420472

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Vol. 35 Journal Issue: 6; ISSN 0734-2101

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 3 works

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References (38)

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