skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Chromium plating pollution source reduction by plasma source ion implantation

Conference ·
OSTI ID:153891
; ; ;  [1]; ; ; ;  [2];  [3]
  1. Univ. of Wisconsin, Madison, WI (United States)
  2. General Motors Research Labs., Warren, MI (United States)
  3. Empire Hard Chrome, Chicago, IL (United States)

There is growing concern over the environmental toxicity and workers` health issues due to the chemical baths and rinse water used in the hard chromium plating process. In this regard the significant hardening response of chromium to nitrogen ion implantation can be environmentally beneficial from the standpoint of decreasing the thickness and the frequency of application of chromium plating. In this paper the results of a study of nitrogen ion implantation of chrome plated test flats using the non-line-of-sight Plasma Source Ion Implantation (PSII) process, are discussed. Surface characterization was performed using Scanning Electron Microscopy (SEM), Auger Electron Spectroscopy (AES), and Electron Spectroscopy for Chemical Analysis (ESCA). The surface properties were evaluated using a microhardness tester, a pin-on-disk wear tester, and a corrosion measurement system. Industrial field testing of nitrogen PSII treated chromium plated parts showed an improvement by a factor of two compared to the unimplanted case.

OSTI ID:
153891
Report Number(s):
CONF-950612-; ISBN 0-7803-2669-5; TRN: 96:001511
Resource Relation:
Conference: 22. international conference on plasma science, Madison, WI (United States), 5-8 Jun 1995; Other Information: PBD: 1995; Related Information: Is Part Of IEEE conference record -- abstracts: 1995 IEEE international conference on plasma science; PB: 312 p.
Country of Publication:
United States
Language:
English