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Methods of forming silicon carbide by spark plasma sintering

Patent ·
OSTI ID:1506948
A method of forming silicon carbide by spark plasma sintering comprises loading a powder comprising silicon carbide into a die and exposing the powder to a pulsed current to heat the powder at a rate of between about 50.degree. C./min and about 200.degree. C./min to a peak temperature while applying a pressure to the powder. The powder is exposed to the peak temperature for between about 30 seconds and about 5 minutes to form a sintered silicon carbide material and the sintered silicon carbide material is cooled. Related structures and methods are disclosed.
Research Organization:
Idaho National Laboratory (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC07-05ID14517
Assignee:
Battelle Energy Alliance, LLC (Idaho Falls, ID)
Patent Number(s):
10,207,956
Application Number:
15/195,313
OSTI ID:
1506948
Country of Publication:
United States
Language:
English

References (5)

Challenges and Opportunities for Spark Plasma Sintering: A Key Technology for a New Generation of Materials book February 2013
Flash Spark Plasma Sintering (FSPS) of α and β SiC journal February 2016
Field assisted sintering of SiC using extreme heating rates journal February 2011
Effects of Initial Punch-Die Clearance in Spark Plasma Sintering Process journal January 2008
Electric Current Activation of Sintering: A Review of the Pulsed Electric Current Sintering Process: Electric Current Activation of Sintering journal November 2010

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