Nonpolar vertical GaN-on-GaN p–n diodes grown on free-standing $$(10\bar{1}0)$$ m -plane GaN substrates
- Arizona State Univ., Tempe, AZ (United States). School of Electrical, Computer, and Energy Engineering
- Chinese Academy of Sciences (CAS), CAS, Suzhou (China). Key Lab. of Nanodevices and Applications, Suzhou Inst. of Nanotech and Nanobionics
- Arizona State Univ., Tempe, AZ (United States). Dept. of Physics
- Chinese Academy of Sciences (CAS), CAS, Suzhou (China). Key Lab. of Nanodevices and Applications, Suzhou Inst. of Nanotech and Nanobionics; Suzhou Nanowin Science and Technology Co., Suzhou (China)
We report nonpolar vertical GaN-on-GaN p–n diodes grown on m-plane free-standing substrates. Cathodoluminescence measurements showed that the nonpolar p-GaN had a high quality with very few deep-level states. The device exhibited good rectifying behaviors with a turn-on voltage of 4.0 V, on-resistance of 2.3 mΩ∙cm2, and high on/off ratio of 1010. The reverse current leakage was described by a trap-assisted space-charge- limited current conduction mechanism. The critical electrical field was calculated to be 2.0 MV/cm without field plates or edge termination. Finally, these results pave the way for development of novel nonpolar power electronics and polarization-engineering-related advanced power devices.
- Research Organization:
- Arizona State Univ., Tempe, AZ (United States)
- Sponsoring Organization:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- Grant/Contract Number:
- AR0000868
- OSTI ID:
- 1505567
- Journal Information:
- Applied Physics Express, Vol. 11, Issue 11; ISSN 1882-0778
- Publisher:
- Japan Society of Applied PhysicsCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Interfacial Impurities and Their Electronic Signatures in High‐Voltage Regrown Nonpolar m‐ Plane GaN Vertical p–n Diodes
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journal | December 2019 |
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