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Developing an Engineered Form of MOFs CaSDB and HKUST –1

Technical Report ·
DOI:https://doi.org/10.2172/1503605· OSTI ID:1503605
Selective Kr and Xe capture to various adsorbents have been studied extensively as part of the Off-gas Sigma Team. In hopes to develop a better adsorbent, Pacific Northwest Nation Laboratory (PNNL) has suggested the use of metal-organic frameworks (MOFs). In 2016, PNNL developed compressed and ground engineered forms of calcium–4,4’–sulfonyl dibenzoate (CaSDB) MOF which was tested at Idaho National Laboratory (INL). The tests found that the CaSDB had a sufficient saturation capacity, but a low breakthrough capacity. The larger issue was that the CaSDB form was not robust enough to withstand handling necessary for installation in a column and flow system. In 2018, PNNL sent two MOFs, CaSDB and Hong Kong University of Science and Technology – 1 (HKUST–1), to INL. INL’s goal was to develop an engineered form that maintained adsorption properties comparable to the original MOFs and was robust enough to use in a column. Initial testing consisted of batch-wise contacts of the MOFs with aprotic solvents and water, to ensure there was not a dramatic degradation of the material. BET analyses confirmed that the MOFs could be exposed to water and DMSO without significant loses in surface area. MOF engineered forms were successfully produced, CaSDB–EF1 and HKUST–EF2, using the INL-patented PAN technique (USA Patent No. 8,686,083, 2013). Brunauer, Emmet and Teller (BET) analyses performed on the engineered forms yielded surface areas of 148 m2/g and 1487 m2/g for CaSDB–EF1 and HKUST–EF2 respectively, 67.6% and 83.7% of the surface areas of the respective pristine materials. Both engineered form MOFs are deemed acceptable for further study to determine efficacy for selective Kr and Xe capture.
Research Organization:
Idaho National Laboratory (INL), Idaho Falls, ID (United States)
Sponsoring Organization:
USDOE Office of Nuclear Energy (NE)
DOE Contract Number:
AC07-05ID14517
OSTI ID:
1503605
Report Number(s):
INL/EXT--19-53200-Rev000
Country of Publication:
United States
Language:
English

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