INTERFACIAL REACTION PATHWAYS AND KINETICS DURING ANNEALING OF 111-TEXTURED AL/TIN BILAYERS: A SYNCHROTRON X-RAY DIFFRACTION AND TRANSMISSION
Journal Article
·
· Journal of Vacuum Science and Technology, A
No abstract prepared.
- Research Organization:
- Brookhaven National Laboratory, National Synchrotron Light Source (US)
- Sponsoring Organization:
- DOE/OFFICE OF SCIENCE (US)
- DOE Contract Number:
- AC02-98CH10886
- OSTI ID:
- 15009099
- Report Number(s):
- BNL-53507; TRN: US0405321
- Journal Information:
- Journal of Vacuum Science and Technology, A, Vol. 19; Other Information: PBD: 1 Jan 2001
- Country of Publication:
- United States
- Language:
- English
Similar Records
Synchrotron X-ray Diffraction and Transmission Electron Microscopy Studies of Interfacial Reaction Paths and Kinetics During Annealing of Fully-002-textured Al/TiN Bilayers
Interfacial Reaction Pathways and Kinetics During Annealing of Epitaxial Al/TiN(001) Model Diffusion Barrier Systems
Al/Ti{sub x}W{sub 1{minus}x} metal/diffusion-barrier bilayers: Interfacial reaction pathways and kinetics during annealing
Journal Article
·
Mon Jan 01 00:00:00 EST 2001
· J. Vac. Sci. Technol. A
·
OSTI ID:15009099
+6 more
Interfacial Reaction Pathways and Kinetics During Annealing of Epitaxial Al/TiN(001) Model Diffusion Barrier Systems
Journal Article
·
Tue Mar 13 00:00:00 EST 2001
· Thin Solid Films
·
OSTI ID:15009099
+3 more
Al/Ti{sub x}W{sub 1{minus}x} metal/diffusion-barrier bilayers: Interfacial reaction pathways and kinetics during annealing
Journal Article
·
Mon Sep 01 00:00:00 EDT 1997
· Journal of Applied Physics
·
OSTI ID:15009099