Localized CO2 Laser Treatment for Mitigation of 3(omega) Damage Growth in Fused Silica
Conference
·
OSTI ID:15002005
A technique for inhibiting the growth of laser-induced surface damage on fused silica, initiated and propagated at the 351 nm laser wavelength, has been investigated. The technique exposes the damage sites to single pulses of a CO{sub 2} laser operating at the 10.6 {micro}m wavelength at or near beam focus. This method results in a very localized treatment of the laser damage site and modifies the site such that laser damage does not propagate further. A laser damage site initiated with a single pulse of 355 nm laser light at {approx} 45 J cm{sup -2} and 7.5 ns pulse duration grows rapidly upon further illumination at 8 J cm{sup -2} with 100% probability. Treatment of these sites with single pulses of 10.6 {micro}m laser light for one second at a power level of between 17 and 37 Watts with a beam diameter of 5 mm alters the damage site such that it does not grow with subsequent 351 nm laser illumination at 8 J cm{sup -2} 10 ns pulse duration for > 1000 shots. The technique has been found to be 100% effective at stopping the growth of the laser damage.
- Research Organization:
- Lawrence Livermore National Lab., CA (US)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 15002005
- Report Number(s):
- UCRL-JC-144297
- Country of Publication:
- United States
- Language:
- English
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