Rutherford Backscattering and Channeling Studies of Al and Mg Diffusion in Iron Oxide Thin Films

Conference · Fri Jan 01 04:00:00 EST 1999

OSTI ID:15001909

Thevuthasan, Theva ^[1]; McCready, David E ^[1]; Jiang, Weilin ^[1]; Mcdaniel, Emily P ^[2]; Yi, Sang I ^[2]; Chambers, Scott A ^[1]

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1. BATTELLE (PACIFIC NW LAB)
2. ASSOC WESTERN UNIVERSITY

Thin films of alpha-Fe2O3(0001) (hermatite) and gamma-Fe2O3 (001) (maghemite) were epitaxially grown on Al2O3(0001) substrates, respectively, using the new molecular beam epitaxy (MBE) system at the Environmental Molecular Sciences Laboratory (EMSL). We have investigated the crystalline quality of these films using Rutherford Backscattering (RBS) and channeling experiments. Minimum yields obtained from aligned and random spectra are 2.7+-0.3% for the alpha-Fe2o3(0001) film and 14.5+-0.6% for the gamma-Fe2O3 (001) film. Al and Mg outdiffusion into the hematite and maghemite films were observed at higher temperatures. Indiffusion of Fe atoms from the film into the substrate was observed for the gamma-Fe2o3(001)/MgO(001) system. In contrast, no Fe indiffusion was observed for the sapphire substrate.

• Research Organization: Pacific Northwest National Lab., Richland, WA (US)
• Sponsoring Organization: US Department of Energy (US)
• DOE Contract Number: AC06-76RL01830
• OSTI ID: 15001909
• Report Number(s): PNNL-SA-30456
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
ACCELERATORS
ATOMS
BACKSCATTERING
CHANNELING
DIFFUSION
HEMATITE
IRON OXIDES
MOLECULAR BEAM EPITAXY
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SAPPHIRE
SPECTRA
SUBSTRATES
THIN FILMS