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Title: Interfacial structure of SrZrxTi1-xO3 films on Ge

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.5046394· OSTI ID:1484681

The interfacial structure of SrZrxTi1-xO3 films grown on semiconducting Ge substrates is investigated here by synchrotron X-ray diffraction and first-principles density functional theory. By systematically tuning the Zr content x, the effects of bonding at the interface and epitaxial strain on the physical structure of the film can be distinguished. The interfacial perovskite layers are found to be polarized as a result of cation-anion ionic displacements perpendicular to the perovskite/semiconductor interface. We find a correlation between the observed buckling and valence band offsets at the SrZrxTi1-xO3/Ge interface. The trends in the theoretical valence band offsets as a function of Zr content for the polar structures are in agreement with reported X-ray photoelectron spectroscopy measurements. Finally, these results have important implications for the integration of functional oxide materials with established semiconductor based technologies.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States); North Carolina State University, Raleigh, NC (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES); National Science Foundation (NSF)
Grant/Contract Number:
AC02-06CH11357; AC02-05CH11231; DMR-1508530
OSTI ID:
1484681
Journal Information:
Applied Physics Letters, Vol. 113, Issue 20; ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 6 works
Citation information provided by
Web of Science

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Epitaxial Oxides on Semiconductors: From Fundamentals to New Devices journal July 2019