Gas-source molecular-beam epitaxy of InGaP and GaAs on strained-relaxed Ge{sub x}Si{sub 1-x}/Si
- AT&T Bell Lab., Murray Hill, NJ (United States); and others
Lattice-matched GaAs and InGaP structures on strain-relieved Ge/graded GeSi/Si without increasing the threading dislocation density at the III-V/Ge interface have been successfully grown. The results show that exposure of the Ge surface to As{sub 2} produces a drastic change in the step structure of the Ge surface. Subsequent exposure to Ga and continuation of growth invariably produces three-dimensional growth and a high threading dislocation density at the GaAs/Ge interface. However, exposure of the Ge surface to Ga does not appear to change the Ge step structure, and subsequent growth of GaAs leads to near two-dimensional growth and no massive increase in threading dislocation density at the GaAs/Ge interface as in the case of As{sub 2} exposure. InGaP light-emitting homojunction diodes have been fabricated on the relaxed Ge/graded GeSi/Si. Room-temperature operation was achieved with a surface-emitting output power of {approximately} 10 mW/cm{sup 2}. The best dislocation density achieved was 5x10{sup 6}-10{sup 7} cm{sup {minus}2} in the InGaP/GaAs/Ge/graded GeSi/Si structure. 9 refs., 3 figs.
- OSTI ID:
- 147026
- Report Number(s):
- CONF-9210296--
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 3 Vol. 11; ISSN 0734-211X; ISSN JVTBD9
- Country of Publication:
- United States
- Language:
- English
Similar Records
High minority-carrier lifetimes in GaAs grown on low-defect-density Ge/GeSi/Si substrates
Strain relaxation of GeSi/Si(001) heterostructures grown by low-temperature molecular-beam epitaxy