Lifetime laser damage performance of β-Ga2O3 for high power applications
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). National Ignition Facility (NIF), Physical and Life Sciences and Photon Sciences
- The Ohio State Univ., Columbus, OH (United States). Dept. of Electrical and Computer Engineering; Case Western Reserve Univ., Cleveland, OH (United States). Dept. of Electrical Engineering and Computer Science
- The Ohio State Univ., Columbus, OH (United States). Dept. of Electrical and Computer Engineering and Dept. of Materials Science and Engineering; Case Western Reserve Univ., Cleveland, OH (United States). Dept. of Electrical Engineering and Computer Science
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States). National Ignition Facility (NIF), Materials Engineering Division and Photon Sciences
Gallium oxide (Ga2O3) is an emerging wide bandgap semiconductor with potential applications in power electronics and high power optical systems where gallium nitride and silicon carbide have already demonstrated unique advantages compared to gallium arsenide and silicon-based devices. Establishing the stability and breakdown conditions of these next-generation materials is critical to assessing their potential performance in devices subjected to large electric fields. Here, by using systematic laser damage performance tests, we establish that β-Ga2O3 has the highest lifetime optical damage performance of any conductive material measured to date, above 10 J/cm2 (1.4 GW/cm2). This has direct implications for its use as an active component in high power laser systems and may give insight into its utility for high-power switching applications. Both heteroepitaxial and bulk β-Ga2O3 samples were benchmarked against a heteroepitaxial gallium nitride sample, revealing an order of magnitude higher optical lifetime damage threshold for β-Ga2O3. Photoluminescence and Raman spectroscopy results suggest that the exceptional damage performance of β-Ga2O3 is due to lower absorptive defect concentrations and reduced epitaxial stress.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- National Science Foundation (NSF); USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1458626
- Alternate ID(s):
- OSTI ID: 1427319
- Report Number(s):
- LLNL-JRNL--741078; 894761
- Journal Information:
- APL Materials, Journal Name: APL Materials Journal Issue: 3 Vol. 6; ISSN 2166-532X
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Gallium Oxide for High‐Power Optical Applications
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