Double sided grating fabrication for high energy X-ray phase contrast imaging

Journal Article · Thu Apr 19 00:00:00 EDT 2018 · Materials Science in Semiconductor Processing

DOI:https://doi.org/10.1016/j.mssp.2018.04.016· OSTI ID:1457363

Hollowell, Andrew E. ^[1]; Arrington, Christian L. ^[1]; Finnegan, Patrick ^[1]; Musick, Kate ^[1]; Resnick, Paul ^[1]; Volk, Steve ^[1]; Dagel, Amber L. ^[1]

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1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)

State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. Furthermore, we have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.

• Research Organization: Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
• Sponsoring Organization: USDOE National Nuclear Security Administration (NNSA)
• Grant/Contract Number: AC04-94AL85000; NA-0003525; SAND2018–0961J
• OSTI ID: 1457363
• Alternate ID(s): OSTI ID: 1875608
• Report Number(s): SAND-2018-0961J; PII: S1369800118301756
• Journal Information: Materials Science in Semiconductor Processing, Vol. 92, Issue 2019; ISSN 1369-8001
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
XPCI
Silicon deep reactive ion etch
Front-to-back alignment
Gratings
Electrocoating
Conformal plating