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Dose dependence of radiation damage in nano-structured amorphous SiOC/crystalline Fe composite

Journal Article · · Materials Research Letters
 [1];  [2];  [2];  [3]
  1. Univ. of Nebraska-Lincoln, Lincoln, NE (United States); Univ. of Nebraska, Lincoln, NE (United States)
  2. Texas A & M Univ., College Station, TX (United States)
  3. Univ. of Nebraska-Lincoln, Lincoln, NE (United States)

Here, through examination of radiation tolerance properties of amorphous silicon oxycarbide (SiOC) and crystalline Fe composite to averaged damage levels, from approximately 8 to 30 displacements per atom (dpa), we demonstrated that the Fe/SiOC interface and the Fe/amorphous FexSiyOz interface act as efficient defect sinks and promote the recombination of vacancies and interstitials. For thick Fe/SiOC multilayers, a clear Fe/SiOC interface remained and no irradiation-induced mixing was observed even after 32 dpa. For thin Fe/SiOC multilayers, an amorphous FexSiyOz intermixed layer was observed to form at 8 dpa, but no further layer growth was observed for higher dpa levels.

Research Organization:
Univ. of Nebraska, Lincoln, NE (United States)
Sponsoring Organization:
USDOE Office of Nuclear Energy (NE)
Grant/Contract Number:
NE0000533
OSTI ID:
1435600
Journal Information:
Materials Research Letters, Journal Name: Materials Research Letters Journal Issue: 1 Vol. 4; ISSN 2166-3831
Publisher:
Taylor and FrancisCopyright Statement
Country of Publication:
United States
Language:
English

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Cited By (3)

Rapid and damage-free outgassing of implanted helium from amorphous silicon oxycarbide journal March 2018
Resistance to Helium Bubble Formation in Amorphous SiOC/Crystalline Fe Nanocomposite journal December 2018
Mechanical Response of He-Implanted Amorphous SiOC/Crystalline Fe Nanolaminates journal March 2019

Figures / Tables (5)


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