Resistance to Helium Bubble Formation in Amorphous SiOC/Crystalline Fe Nanocomposite

Su, Qing; Wang, Tianyao; Gigax, Jonathan; Shao, Lin; Nastasi, Michael

doi:10.3390/ma12010093

Resistance to Helium Bubble Formation in Amorphous SiOC/Crystalline Fe Nanocomposite

Journal Article · Thu Dec 27 23:00:00 EST 2018 · Materials

DOI:https://doi.org/10.3390/ma12010093· OSTI ID:2373200

; Wang, Tianyao; Gigax, Jonathan; Shao, Lin; Nastasi, Michael

The management of radiation defects and insoluble He atoms represent key challenges for structural materials in existing fission reactors and advanced reactor systems. To examine how crystalline/amorphous interface, together with the amorphous constituents affects radiation tolerance and He management, we studied helium bubble formation in helium ion implanted amorphous silicon oxycarbide (SiOC) and crystalline Fe composites by transmission electron microscopy (TEM). The SiOC/Fe composites were grown via magnetron sputtering with controlled length scale on a surface oxidized Si (100) substrate. These composites were subjected to 50 keV He+ implantation with ion doses chosen to produce a 5 at% peak He concentration. TEM characterization shows no sign of helium bubbles in SiOC layers nor an indication of secondary phase formation after irradiation. Compared to pure Fe films, helium bubble density in Fe layers of SiOC/Fe composite is less and it decreases as the amorphous/crystalline SiOC/Fe interface density increases. Our findings suggest that the crystalline/amorphous interface can help to mitigate helium defect generated during implantation, and therefore enhance the resistance to helium bubble formation.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: NE0000533

OSTI ID:: 2373200

Alternate ID(s):: OSTI ID: 1613830

Journal Information:: Materials, Journal Name: Materials Journal Issue: 1 Vol. 12; ISSN MATEG9; ISSN 1996-1944

Publisher:: MDPI AGCopyright Statement

Country of Publication:: Switzerland

Language:: English

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