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Title: Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry

Journal Article · · Plasma Sources Science and Technology
 [1];  [2];  [3];  [4];  [5];  [5];  [5];  [1];  [6]
  1. Ecole Polytechnique, Palaiseau (France). LPICM-CNRS
  2. Univ. of Houston, Houston, TX (United States). Plasma Processing Lab., Dept. of Chemical & Biomolecular Engineering; Dutch Inst. for Fundamental Energy Research (DIFFER). FOM Inst.
  3. Univ. of Houston, Houston, TX (United States). Plasma Processing Lab., Dept. of Chemical & Biomolecular Engineering
  4. Univ. degli Studi di Bari (Italy). Dipt. di Chimica
  5. Univ. of York (United Kingdom). York Plasma Inst., Dept. of Physics
  6. Ecole Polytechnique, Palaiseau (France); Univ. Paris-Sud, Palaiseau (France)

Parallel plate capacitively coupled plasmas in hydrogen at relatively high pressure (~1 Torr) are excited with tailored voltage waveforms containing up to five frequencies. Predictions of a hybrid model combining a particle-in-cell simulation with Monte Carlo collisions and a fluid model are compared to phase resolved optical emission spectroscopy measurements, yielding information on the dynamics of the excitation rate in these discharges. When the discharge is excited with amplitude asymmetric waveforms, the discharge becomes electrically asymmetric, with different ion energies at each of the two electrodes. Unexpectedly, large differences in the $$\text{H}_{2}^{+}$$ fluxes to each of the two electrodes are caused by the different $$\text{H}_{3}^{+}$$ energies. When the discharge is excited with slope asymmetric waveforms, only weak electrical asymmetry of the discharge is observed. In this case, electron power absorption due to fast sheath expansion at one electrode is balanced by electron power absorption at the opposite electrode due to a strong electric field reversal.

Research Organization:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Fusion Energy Sciences (FES)
Grant/Contract Number:
SC0001939
OSTI ID:
1434929
Journal Information:
Plasma Sources Science and Technology, Vol. 25, Issue 4; ISSN 0963-0252
Publisher:
IOP PublishingCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 10 works
Citation information provided by
Web of Science

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Cited By (1)

Monte Carlo calculation of the potential energy surface for octahedral confined H$$_2^+$$2+ journal January 2018