Dual-gate operation and carrier transport in SiGe p–n junction nanowires
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
Here, we investigate carrier transport in silicon–germanium nanowires with an axial p–n junction doping profile by fabricating these wires into transistors that feature separate top gates over each doping segment. By independently biasing each gate, carrier concentrations in the n- and p-side of the wire can be modulated. For these devices, which were fabricated with nickel source–drain electrical contacts, holes are the dominant charge carrier, with more favorable hole injection occurring on the p-side contact. Channel current exhibits greater sensitivity to the n-side gate, and in the reverse biased source–drain configuration, current is limited by the nickel/n-side Schottky contact.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC04-94AL85000
- OSTI ID:
- 1421644
- Alternate ID(s):
- OSTI ID: 1425761
OSTI ID: 22798359
- Report Number(s):
- SAND--2017-12601J; 658878
- Journal Information:
- Nanotechnology, Journal Name: Nanotechnology Journal Issue: 46 Vol. 28; ISSN 0957-4484
- Publisher:
- IOP PublishingCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Plastic recovery and self-healing in longitudinally twinned SiGe nanowires
|
journal | January 2019 |
Plastic recovery and self-healing in longitudinally twinned SiGe nanowires
|
text | January 2021 |
Similar Records
Gate assisted Kelvin test structure to measure the electron and hole flows at the same nanowire contacts
Top-gate organic depletion and inversion transistors with doped channel and injection contact