Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS

Yao, Yunxi; Zaera, Francisco

doi:10.1116/1.4927843

Thermal chemistry of copper acetamidinate atomic layer deposition precursors on silicon oxide surfaces studied by XPS

Journal Article · Mon Aug 03 00:00:00 EDT 2015 · Journal of Vacuum Science and Technology A

DOI:https://doi.org/10.1116/1.4927843· OSTI ID:1421135

Yao, Yunxi ^[1]; Zaera, Francisco ^[1]

Department of Chemistry, University of California, Riverside, California 92521

Not Available

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0001839

OSTI ID:: 1421135

Alternate ID(s):: OSTI ID: 22489735

Journal Information:: Journal of Vacuum Science and Technology A, Journal Name: Journal of Vacuum Science and Technology A Journal Issue: 1 Vol. 34; ISSN 0734-2101; ISSN JVTAD6

Publisher:: American Vacuum SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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