Molecular tailoring of surfaces via pulsed RF plasma depositions

Conference · Fri Dec 31 04:00:00 EST 1993

OSTI ID:141625

Panchalingam, V; Chen, X; Savage, C R; Timmons, R B ^[1]

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1. Univ. of Texas, Arlington, TX (United States)

Plasma polymerizations carried out using pulsed, in lieu of conventional continuous wave, plasmas will be described. The focus of this work is to demonstrate that the molecular composition of polymeric thin films obtained during the plasma depositions are a strong function of the RF duty cycle employed, all other plasma variables being held constant. The variations in the molecular compositions of the plasma deposited films with changing RF duty cycles is illustrated for polymerizations carried out using halogenated methanes and perfluorinated monomers. The plasma deposited films obtained are characterized primarily by XPS and FT-IR spectroscopies. In general, maximal variations in film compositions with changing RF duty cycles are observed in plasma on/off time domains ranging from approximately one to five hundred milliseconds. In addition to film compositional changes, film deposition rates also exhibit significant variations with changing RF duty cycles. Overall the results obtained are supportive of employing the pulsed RF deposition technique as a new approach to molecular tailoring of surfaces for specific applications.

• OSTI ID: 141625
• Report Number(s): CONF-930304--
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
40 CHEMISTRY
CHEMICAL RADIATION EFFECTS
DEPOSITION
METHANE
ORGANIC FLUORINE COMPOUNDS
ORGANIC POLYMERS
POLYMERIZATION
PULSED IRRADIATION
RADIOWAVE RADIATION
SURFACE FINISHING