Sputter-deposited WOx and MoOx for hole selective contacts
- Fraunhofer Institute for Solar Energy Systems ISE, Freiburg (Germany)
- Fraunhofer Institute for Solar Energy Systems ISE, Freiburg (Germany); National Renewable Energy Lab. (NREL), Golden, CO (United States)
Here, reactive sputter deposited tungsten and molybdenum oxide (WOx, MoOx) thin films are tested for their ability to form a hole selective contact for Si wafer based solar cells. A characterization approach based on analyzing the band bending induced in the c-Si absorber and the external and implied open-circuit voltage of test structures was used. It is shown that the oxygen partial pressure allows to tailor the selectivity to some extent and that a direct correlation between induced band bending and hole selectivity exists. Although the selectivity of the sputtered films is inferior to the reference films deposited by thermal evaporation, these results demonstrate a good starting point for further optimizations of sputtered WOx and MoOx towards higher work functions to improve the hole selectivity.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- German Federal Ministry for Economic Affairs and Energy; USDOE
- Grant/Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1408996
- Report Number(s):
- NREL/JA-5J00-70502
- Journal Information:
- Energy Procedia (Online), Vol. 124, Issue C; ISSN 1876-6102
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Requirements for efficient hole extraction in transition metal oxide-based silicon heterojunction solar cells
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journal | August 2018 |
Kinetic Monte Carlo simulation of transport in amorphous silicon passivation layers in silicon heterojunction solar cells
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journal | July 2019 |
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