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Title: Sputter-deposited WOx and MoOx for hole selective contacts

Journal Article · · Energy Procedia (Online)
 [1];  [1];  [2];  [1]
  1. Fraunhofer Institute for Solar Energy Systems ISE, Freiburg (Germany)
  2. Fraunhofer Institute for Solar Energy Systems ISE, Freiburg (Germany); National Renewable Energy Lab. (NREL), Golden, CO (United States)

Here, reactive sputter deposited tungsten and molybdenum oxide (WOx, MoOx) thin films are tested for their ability to form a hole selective contact for Si wafer based solar cells. A characterization approach based on analyzing the band bending induced in the c-Si absorber and the external and implied open-circuit voltage of test structures was used. It is shown that the oxygen partial pressure allows to tailor the selectivity to some extent and that a direct correlation between induced band bending and hole selectivity exists. Although the selectivity of the sputtered films is inferior to the reference films deposited by thermal evaporation, these results demonstrate a good starting point for further optimizations of sputtered WOx and MoOx towards higher work functions to improve the hole selectivity.

Research Organization:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Organization:
German Federal Ministry for Economic Affairs and Energy; USDOE
Grant/Contract Number:
AC36-08GO28308
OSTI ID:
1408996
Report Number(s):
NREL/JA-5J00-70502
Journal Information:
Energy Procedia (Online), Vol. 124, Issue C; ISSN 1876-6102
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 29 works
Citation information provided by
Web of Science

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Cited By (2)

Requirements for efficient hole extraction in transition metal oxide-based silicon heterojunction solar cells journal August 2018
Kinetic Monte Carlo simulation of transport in amorphous silicon passivation layers in silicon heterojunction solar cells journal July 2019