Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors

Liang, Kun; Marcus, Kyle; Yang, Zhenzhong; Zhou, Le; Pan, Hao; Bai, Yuanli; Du, Yingge; Engelhard, Mark H.; Yang, Yang

doi:10.1002/smll.201702295

Freestanding NiFe Oxyfluoride Holey Film with Ultrahigh Volumetric Capacitance for Flexible Asymmetric Supercapacitors

Journal Article · Mon Nov 13 23:00:00 EST 2017 · Small

DOI:https://doi.org/10.1002/smll.201702295· OSTI ID:1408786

Liang, Kun ^[1]; Marcus, Kyle ^[1]; Yang, Zhenzhong ^[2]; Zhou, Le ^[3]; Pan, Hao ^[4]; Bai, Yuanli ^[4]; Du, Yingge ^[2]; Engelhard, Mark H. ^[5]; ^[6]

NanoScience Technology Center University of Central Florida Orlando FL 32826 USA
Physical and Computational Sciences Directorate Pacific Northwest National Laboratory Richland WA 99352 USA
Department of Materials Science and Engineering University of Central Florida Orlando FL 32826 USA
Department of Mechanical and Aerospace Engineering University of Central Florida Orlando FL 32816 USA
Environmental Molecular Sciences Laboratory Pacific Northwest National Laboratory Richland WA 99352 USA
NanoScience Technology Center University of Central Florida Orlando FL 32826 USA, Department of Materials Science and Engineering University of Central Florida Orlando FL 32826 USA

Abstract

In this work, a freestanding NiFe oxyfluoride (NiFeOF) holey film is prepared by electrochemical deposition and anodic treatments. With the combination of good electrical conductivity and holey structure, the NiFeOF holey film offers superior electrochemical performance with maximum specific capacitance of 670 F cm ⁻³ (134 mF cm ⁻² ), due to the following reasons: (i) The residual metal alloy framework can be used as the current collector to improve electrode conductivity. Moreover, the as‐prepared freestanding NiFeOF holey film can be used as a supercapacitor electrode without reliance on binders and other additives. The residual metal alloy framework and binder‐free electrode effectively reduce electrode resistance, thus improving electron transport. (ii) The highly interconnected holey structure and hierarchical pore distribution provide a high specific surface area to improve electron transport, enhancing rapid ion transport, and mitigating diffusion limitations throughout the holey film. (iii) The excellent mechanical characteristics facilitate flexibility and cyclability related performance. Additionally, the NiFeOF holey film presents exceptional electrochemical performance, showing that it is a promising alternative for small/microsize electronic devices.

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

OSTI ID:: 1408786

Alternate ID(s):: OSTI ID: 1439669

Journal Information:: Small, Journal Name: Small Journal Issue: 3 Vol. 14; ISSN 1613-6810

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: Germany

Language:: English

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