Plasma Treatment of Onychomycosis

Xiong, Zilan; Roe, Jeffrey; Grammer, Timothy C.; Graves, David B.

doi:10.1002/ppap.201600010

Plasma Treatment of Onychomycosis

Journal Article · Sat Apr 09 00:00:00 EDT 2016 · Plasma Processes and Polymers

DOI:https://doi.org/10.1002/ppap.201600010· OSTI ID:1401660

Xiong, Zilan ^[1]; Roe, Jeffrey ^[2]; Grammer, Timothy C. ^[2]; Graves, David B. ^[1]

Department of Chemical and Biomolecular Engineering University of California Berkeley California 94720 USA
DeviceFarm, Inc. Newark California 94560 USA

We report on the use of three “cold” atmospheric plasma (CAP) devices in treating model nails that have been coated on the backside of the nail with either Escherichia coli ( E. coli ) bacteria or Trichophyton rubrum ( T. rubrum ) fungus. We tested a helium plasma jet; a surface microdischarge plasma device; and a floating electrode dielectric barrier discharge. All of the devices, acting through the model nail, showed significant log reductions of bacterial and fungal targets in several tens of minutes. CAP technology appears to offer promise as a safe, effective, and inexpensive therapy for fungal nail infection treatment.

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE

Grant/Contract Number:: SC0008380; SC0012500

OSTI ID:: 1401660

Journal Information:: Plasma Processes and Polymers, Journal Name: Plasma Processes and Polymers Journal Issue: 6 Vol. 13; ISSN 1612-8850

Publisher:: Wiley Blackwell (John Wiley & Sons)Copyright Statement

Country of Publication:: Germany

Language:: English

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