skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: High efficiency low threshold current 1.3  μ m InAs quantum dot lasers on on-axis (001) GaP/Si

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4993226· OSTI ID:1393694

We demonstrate highly efficient, low threshold InAs quantum dot lasers epitaxially grown on on-axis (001) GaP/Si substrates using molecular beam epitaxy. Electron channeling contrast imaging measurements show a threading dislocation density of 7.3 × 106 cm−2 from an optimized GaAs template grown on GaP/Si. The high-quality GaAs templates enable as-cleaved quantum dot lasers to achieve a room-temperature continuous-wave (CW) threshold current of 9.5 mA, a threshold current density as low as 132 A/cm2, a single-side output power of 175 mW, and a wall-plug-efficiency of 38.4% at room temperature. As-cleaved QD lasers show ground-state CW lasing up to 80 °C. The application of a 95% high-reflectivity coating on one laser facet results in a CW threshold current of 6.7 mA, which is a record-low value for any kind of Fabry-Perot laser grown on Si.

Sponsoring Organization:
USDOE Advanced Research Projects Agency - Energy (ARPA-E)
Grant/Contract Number:
AR0000672
OSTI ID:
1393694
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Vol. 111 Journal Issue: 12; ISSN 0003-6951
Publisher:
American Institute of PhysicsCopyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 106 works
Citation information provided by
Web of Science

References (21)

High performance continuous wave 1.3  μ m quantum dot lasers on silicon journal January 2014
1.3 μm InAs quantum dot laser with To=161 K from 0 to 80 °C journal May 2002
The commercialization of silicon photonics journal July 2014
Misfit stress dependence of dislocation density reduction in GaAs films on Si substrates grown by strained‐layer superlattices journal June 1989
Heteroepitaxy of GaP on Si: Correlation of morphology, anti-phase-domain structure and MOVPE growth conditions journal April 2008
Molecular beam epitaxial growths of high-optical-gain InAs quantum dots on GaAs for long-wavelength emission journal September 2013
Energy-efficient communication journal May 2011
On the (110) orientation as the preferred orientation for the molecular beam epitaxial growth of GaAs on Ge, GaP on Si, and similar zincblende‐on‐diamond systems journal May 1980
Electrically pumped continuous wave quantum dot lasers epitaxially grown on patterned, on-axis (001) Si journal January 2017
Degradation behavior of 0.98-μm strained quantum well InGaAs/AlGaAs lasers under high-power operation journal January 1994
13-μm InAs/GaAs quantum-dot lasers monolithically grown on Si substrates journal January 2011
Recent advances in silicon photonic integrated circuits conference February 2016
MBE growth of P-doped 1.3  μ m InAs quantum dot lasers on silicon
  • Liu, Alan Y.; Zhang, Chong; Snyder, Andrew
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 2 https://doi.org/10.1116/1.4864148
journal March 2014
InAs/GaAs Quantum-Dot Lasers Monolithically Grown on Si, Ge, and Ge-on-Si Substrates journal July 2013
Electrically pumped continuous-wave III–V quantum dot lasers on silicon journal March 2016
Electrically pumped continuous-wave 13 µm InAs/GaAs quantum dot lasers monolithically grown on on-axis Si (001) substrates journal January 2017
Electrically pumped continuous-wave 13  μm quantum-dot lasers epitaxially grown on on-axis (001)  GaP/Si journal January 2017
Reliability of InAs/GaAs Quantum Dot Lasers Epitaxially Grown on Silicon journal November 2015
Improvement of catastrophic optical damage level of AlGaInP visible laser diodes by sulfur treatment journal June 1991
Thermal annealing effects of defect reduction in GaAs on Si substrates journal November 1990
Threading dislocation density characterization in III–V photovoltaic materials by electron channeling contrast imaging journal November 2016

Similar Records

InAs/GaAs quantum dots on GaAs-on-V-grooved-Si substrate with high optical quality in the 1.3 μm band
Journal Article · Mon Aug 24 00:00:00 EDT 2015 · Applied Physics Letters · OSTI ID:1393694

Low Threshold Quantum Dot Lasers Directly Grown on Unpatterned Quasi-Nominal (001) Si
Journal Article · Sun Mar 01 00:00:00 EST 2020 · IEEE Journal of Selected Topics in Quantum Electronics · OSTI ID:1393694

High performance InAs quantum dot lasers on silicon substrates by low temperature Pd-GaAs wafer bonding
Journal Article · Mon Dec 28 00:00:00 EST 2015 · Applied Physics Letters · OSTI ID:1393694

Related Subjects