Development characteristics of polymethyl methacrylate in alcohol/water mixtures: a lithography and Raman spectroscopy study

Journal Article · Thu Dec 10 00:00:00 EST 2015 · Nanotechnology

DOI:https://doi.org/10.1088/0957-4484/27/3/035302· OSTI ID:1392552

Ocola, Leonidas E.; Costales, Maya; Gosztola, David J.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1392552
• Journal Information: Nanotechnology, Vol. 27, Issue 3; ISSN 0957-4484
• Publisher: IOP Publishing
• Country of Publication: United States
• Language: English

Related Subjects

PMMA
developer
electron beam lithography
ethanol
resists