Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water

Avila, J. R.; Peters, A. W.; Li, Zhanyong; Ortuño, M. A.; Martinson, A. B.  F.; Cramer, C. J.; Hupp, J. T.; Farha, O. K.

doi:10.1039/C6DT02572B

Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water

Journal Article · Sun Jan 01 04:00:00 EST 2017 · Dalton Transactions

DOI:https://doi.org/10.1039/C6DT02572B· OSTI ID:1388895

^[1]; Peters, A. W. ^[1]; ^[2]; Ortuño, M. A. ^[3]; ^[4]; Cramer, C. J. ^[3]; Hupp, J. T. ^[1]; Farha, O. K. ^[5]

Department of Chemistry; Northwestern University; Evanston; USA; Argonne-Northwestern Solar Energy Research (ANSER) Center
Department of Chemistry; Northwestern University; Evanston; USA
Department of Chemistry; Chemical Theory Center; and Supercomputing Institute; University of Minnesota; Minneapolis
Argonne-Northwestern Solar Energy Research (ANSER) Center; Northwestern University; Evanston; USA; Argonne National Laboratory
Department of Chemistry; Northwestern University; Evanston; USA; King Abdulaziz University

To grow films of Cu₂O, bis-(dimethylamino-2-propoxide)Cu(ii), or Cu(dmap), is used as an atomic layer deposition precursor using only water vapor as a co-reactant.

Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Energy Frontier Research Center for Inorganometallic Catalyst Design (ICDC)

Sponsoring Organization:: USDOE SC Office of Basic Energy Sciences (SC-22)

DOE Contract Number:: SC0012702

OSTI ID:: 1388895

Journal Information:: Dalton Transactions, Journal Name: Dalton Transactions Journal Issue: 18 Vol. 46; ISSN 1477-9226; ISSN ICHBD9

Publisher:: Royal Society of Chemistry

Country of Publication:: United States

Language:: English

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