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The source of holes in p-type In x Ga 1-x N films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4759242· OSTI ID:1382741

The origin of holes in Mg-doped InxGa1-xN films is investigated using electron paramagnetic resonance (EPR) spectroscopy. Unlike in Mg-doped GaN, the number of Mg-related acceptors in films with x between 0.021 and 0.112 decreases as the hole density increases. The EPR results indicate that the previously suggested models involving isolated acceptors or band formation cannot adequately explain hole production in InGaN. Rather, additional features such as In-induced passivating centers must be introduced.

Research Organization:
Energy Frontier Research Centers (EFRC) (United States). EFRC for Solid State Lighting Science (SSLS)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
DOE Contract Number:
AC04-94AL85000
OSTI ID:
1382741
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 112; ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English

References (8)

Mg-acceptor activation mechanism and transport characteristics in p-type InGaN grown by metalorganic vapor phase epitaxy journal March 2003
GaN Growth Using GaN Buffer Layer journal October 1991
Nitride-Based Green Light-Emitting Diodes With Various p-Type Layers journal June 2007
Mg in GaN: the structure of the acceptor and the electrical activity journal September 2003
Optical and electrical properties of Mg-doped p-type AlxGa1−xN journal February 2002
Magnetic resonance studies of Mg-doped GaN epitaxial layers grown by organometallic chemical vapor deposition journal February 2002
Nature of acceptor states in magnesium-doped gallium nitride journal May 2005
Electrical and optical properties of p-type InGaN journal December 2009

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