Effect of substrate temperature on the photoelectrochemical responses of Ga and N co-doped ZnO films
Journal Article
·
· Journal of Materials Science
Ga–N co-doped ZnO thin films with reduced bandgaps were deposited on F-doped tin-oxide-coated glass by radio-frequency magnetron sputtering at different substrate temperatures in mixed N2 and O2 gas ambient. We found that Ga–N co-doped ZnO films exhibited enhanced crystallinity when compared to undoped ZnO films grown under the same conditions. Furthermore, Ga–N co-doping ensured enhanced N-incorporation ZnO thin films as the substrate temperature is increased. As a result, Ga–N co-doped ZnO thin films exhibited much improved photoelectrochemical (PEC) response, compared to ZnO thin films. Our results therefore suggest that the passive co-doping approach could be a means to improve PEC response for bandgap-reduced wide-bandgap oxides through impurity incorporation.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE)
- DOE Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1372618
- Report Number(s):
- NREL/JA--520-45946
- Journal Information:
- Journal of Materials Science, Journal Name: Journal of Materials Science Journal Issue: 19 Vol. 45; ISSN 0022-2461
- Publisher:
- Springer
- Country of Publication:
- United States
- Language:
- English
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