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Effect of substrate temperature on the photoelectrochemical responses of Ga and N co-doped ZnO films

Journal Article · · Journal of Materials Science
Ga–N co-doped ZnO thin films with reduced bandgaps were deposited on F-doped tin-oxide-coated glass by radio-frequency magnetron sputtering at different substrate temperatures in mixed N2 and O2 gas ambient. We found that Ga–N co-doped ZnO films exhibited enhanced crystallinity when compared to undoped ZnO films grown under the same conditions. Furthermore, Ga–N co-doping ensured enhanced N-incorporation ZnO thin films as the substrate temperature is increased. As a result, Ga–N co-doped ZnO thin films exhibited much improved photoelectrochemical (PEC) response, compared to ZnO thin films. Our results therefore suggest that the passive co-doping approach could be a means to improve PEC response for bandgap-reduced wide-bandgap oxides through impurity incorporation.
Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
DOE Contract Number:
AC36-08GO28308
OSTI ID:
1372618
Report Number(s):
NREL/JA--520-45946
Journal Information:
Journal of Materials Science, Journal Name: Journal of Materials Science Journal Issue: 19 Vol. 45; ISSN 0022-2461
Publisher:
Springer
Country of Publication:
United States
Language:
English

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