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Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

Journal Article · Wed Jun 01 04:00:00 EDT 2016 · Surface Science Reports

DOI:https://doi.org/10.1016/j.surfrep.2016.03.003· OSTI ID:1370176

Lu, Junling; Elam, Jeffrey W.; Stair, Peter C.

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Research Organization:: Energy Frontier Research Centers (EFRC) (United States). Institute for Atom-efficient Chemical Transformations (IACT)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

DOE Contract Number:: AC02-06CH11357

OSTI ID:: 1370176

Journal Information:: Surface Science Reports, Journal Name: Surface Science Reports Journal Issue: 2 Vol. 71; ISSN 0167-5729

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

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