Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis

Journal Article · Wed Jun 01 00:00:00 EDT 2016 · Surface Science Reports

DOI:https://doi.org/10.1016/j.surfrep.2016.03.003· OSTI ID:1326421

Lu, Junling; Elam, Jeffrey W.; Stair, Peter C.

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• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES)
• OSTI ID: 1326421
• Alternate ID(s): OSTI ID: 1370176
• Journal Information: Surface Science Reports, Journal Name: Surface Science Reports Journal Issue: 2 Vol. 71; ISSN 0167-5729
• Publisher: Elsevier
• Country of Publication: Netherlands
• Language: English