In situ thickness monitoring and control for highly reproducible growth of distributed Bragg reflectors
- Hewlett-Packard Labs., Palo Alto, CA (United States); and others
A theoretical model was developed to simulate the apparent substrate temperature oscillation during the growth of Al/As/Al{sub x}Ga{sub 1-x}As, x=O and 0.25 distributed Bragg reflectors (DBR) for 980-and 780-nm vertical cavity surface emitting lasers, respectively. The simulated data were then used for in situ monitoring and feedback control of layer thickness by a simple pyrometric interferometry technique to obtain a highly reproducible DBR. These measurements can be performed with continuous substrate rotation and without any growth interruption. The reproducibility of the center wavelength and full width at half-maximum of the reflectivity stop band with a variation of <{plus_minus}0.2% and <{plus_minus}0.4% for the AlAs/GaAs and AlAs/AlGaAs mirror stacks, respectively, were achieved. 12 refs., 5 figs.
- OSTI ID:
- 136256
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 2 Vol. 12; ISSN 0734-211X; ISSN JVTBD9
- Country of Publication:
- United States
- Language:
- English
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