Broad ion energy distributions in helicon wave-coupled helium plasma

Woller, K. B.; Whyte, D. G.; Wright, G. M.

doi:10.1063/1.4983315

Broad ion energy distributions in helicon wave-coupled helium plasma

Journal Article · Thu May 11 00:00:00 EDT 2017 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.4983315· OSTI ID:1466016

^[1]; Whyte, D. G. ^[2]; Wright, G. M. ^[2]

Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States); MIT, Plasma Sci & Fus Ctr, 175 Albany St, Cambridge, MA 02139 USA
Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)

Helium ion energy distributions were measured in helicon wave-coupled plasmas of the dynamics of ion implantation and sputtering of surface experiment using a retarding field energy analyzer. The shape of the energy distribution is a double-peak, characteristic of radiofrequency plasma potential modulation. The broad distribution is located within a radius of 0.8 cm, while the quartz tube of the plasma source has an inner radius of 2.2 cm. The ion energy distribution rapidly changes from a double-peak to a single peak in the radius range of 0.7–0.9 cm. The average ion energy is approximately uniform across the plasma column including the double-peak and single peak regions. The widths of the broad distribution, ΔE, in the wave-coupled mode are large compared to the time-averaged ion energy, < E >. On the axis (r = 0), ΔE/< E > ≲ 3.4, and at a radius near the edge of the plasma column (r = 2.2 cm), ΔE/< E > ~1.2. In conclusion, the discharge parameter space is scanned to investigate the effects of the magnetic field, input power, and chamber fill pressure on the wave-coupled mode that exhibits the sharp radial variation in the ion energy distribution.

View Accepted Manuscript (DOE)

Research Organization:: Massachusetts Inst. of Technology (MIT), Cambridge, MA (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: FC02-99ER54512

OSTI ID:: 1466016

Alternate ID(s):: OSTI ID: 1361886

Journal Information:: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 5 Vol. 24; ISSN 1070-664X

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Study of the properties of thin Li films and their relationship with He plasmas using ion beam analysis in the DIONISOS experiment Bedoya, F.; Woller, K. B.; Whyte, D. G. Review of Scientific Instruments, Vol. 89, Issue 10 https://doi.org/10.1063/1.5034240	journal	October 2018
He-ion induced surface morphology change and nanofuzz growth on hot tungsten surfaces Meyer, F. W. Journal of Physics B: Atomic, Molecular and Optical Physics, Vol. 52, Issue 1 https://doi.org/10.1088/1361-6455/aaf060	journal	December 2018

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