H + ion-induced damage and etching of multilayer graphene in H 2 plasmas

Davydova, A.; Despiau-Pujo, E.; Cunge, G.; Graves, D. B.

doi:10.1063/1.4979023

H ⁺ ion-induced damage and etching of multilayer graphene in H ₂ plasmas

Journal Article · Fri Apr 07 04:00:00 EDT 2017 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.4979023· OSTI ID:1361793

Davydova, A. ^[1]; Despiau-Pujo, E. ^[1]; Cunge, G. ^[1]; Graves, D. B. ^[2]

Univ. Grenoble Alpes, CNRS, CEA-Leti Minatec, LTM, 38054 Grenoble Cedex, France
Department of Chemical Engineering, University of California at Berkeley, Berkeley, California 94720, USA

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Sponsoring Organization:: USDOE

OSTI ID:: 1361793

Journal Information:: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 13 Vol. 121; ISSN 0021-8979

Publisher:: American Institute of PhysicsCopyright Statement

Country of Publication:: United States

Language:: English

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