3D elemental mapping with nanometer scale depth resolution via electron optical sectioning
Journal Article
·
· Ultramicroscopy
- Daresbury Lab., Warrington (United Kingdom). EPSRC SuperSTEM Facility; Univ. of Oxford (United Kingdom). Dept. of Materials
- Univ. of Oxford (United Kingdom). Dept. of Materials
- Complutense Univ. of Madrid (Spain). Complex Materials Physics Group
- Complutense Univ. of Madrid (Spain). Complex Materials Physics Group; Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Materials Science and Technology Division
Electron energy loss spectroscopy in the scanning transmission electron microscope has long been used to perform elemental mapping but has not previously exhibited depth sensitivity. The key to depth resolution with optical sectioning is the transfer of sufficiently high lateral spatial frequencies. By performing spectrum imaging with atomic resolution we achieve in this paper nanometer scale depth resolution, enabling us to optically section an oxide heterostructure spectroscopically. Finally, such 3D elemental mapping is sensitive to atomic scale changes in structure and composition and is more interpretable than Z-contrast imaging alone.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Complutense Univ. of Madrid (Spain); Univ. of Oxford (United Kingdom)
- Sponsoring Organization:
- USDOE; Engineering and Physical Sciences Research Council (EPSRC) (United Kingdom); European Union (EU) (Belgium); European Research Council (ERC) (Belgium); Ministry of Economy, Industry and Competitiveness (MINECO) (Spain)
- Contributing Organization:
- Daresbury Lab., Warrington (United Kingdom)
- DOE Contract Number:
- AC05-00OR22725
- OSTI ID:
- 1360083
- Journal Information:
- Ultramicroscopy, Journal Name: Ultramicroscopy Vol. 174; ISSN 0304-3991
- Publisher:
- Elsevier
- Country of Publication:
- United States
- Language:
- English
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