Comparative study of the oxidation of NiAl(100) by molecular oxygen and water vapor using ambient-pressure X-ray photoelectron spectroscopy

Journal Article · Tue Oct 11 00:00:00 EDT 2016 · Langmuir

DOI:https://doi.org/10.1021/acs.langmuir.6b02752· OSTI ID:1345737

Liu, Qianqian ^[1]; Qin, Hailang ^[1]; Boscoboinik, Jorge Anibal ^[2]; Zhou, Guangwen ^[1]

---

1. State Univ. of New York, Binghamton, NY (United States)
2. Brookhaven National Lab. (BNL), Upton, NY (United States)

The oxidation behavior of NiAl(100) by molecular oxygen and water vapor under a near-ambient pressure of 0.2 Torr is monitored using ambient-pressure X-ray photoelectron spectroscopy. O₂ exposure leads to the selective oxidation of Al at temperatures ranging from 40 to 500 °C. By contrast, H₂O exposure results in the selective oxidation of Al at 40 and 200 °C, and increasing the oxidation temperature above 300 °C leads to simultaneous formation of both Al and Ni oxides. Furthermore, these results demonstrate that the O₂ oxidation forms a nearly stoichiometric Al₂O₃ structure that provides improved protection to the metallic substrate by barring the outward diffusion of metals. By contrast, the H₂O oxidation results in the formation of a defective oxide layer that allows outward diffusion of Ni at elevated temperatures for simultaneous NiO formation.

• Research Organization: Brookhaven National Laboratory (BNL), Upton, NY (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
• OSTI ID: 1345737
• Report Number(s): BNL--113577-2017-JA; KC0403020
• Journal Information: Langmuir, Journal Name: Langmuir Journal Issue: 44 Vol. 32; ISSN 0743-7463
• Publisher: American Chemical Society
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE