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Atom Probe Analysis of III–V and Si-Based Semiconductor Photovoltaic Structures

Journal Article · · Microscopy and Microanalysis
The applicability of atom probe to the characterization of photovoltaic devices is presented with special emphasis on high efficiency III–V and low cost ITO/a-Si:H heterojunction cells. Laser pulsed atom probe is shown to enable subnanometer chemical and structural depth profiling of interfaces in III–V heterojunction cells. Hydrogen, oxygen, and phosphorus chemical profiling in 5-nm-thick a-Si heterojunction cells is also illustrated, along with compositional analysis of the ITO/a-Si interface. Detection limits of atom probe tomography useful to semiconductor devices are also discussed. Gaining information about interfacial abruptness, roughness, and dopant profiles will allow for the determination of semiconductor conductivity, junction depletion widths, and ultimately photocurrent collection efficiencies and fill factors.
Research Organization:
National Renewable Energy Lab. (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE; National Renewable Energy Laboratory (NREL), Laboratory Directed Research and Development (LDRD) Program
DOE Contract Number:
AC36-08GO28308
OSTI ID:
1344974
Report Number(s):
NREL/JA--520-42528
Journal Information:
Microscopy and Microanalysis, Journal Name: Microscopy and Microanalysis Journal Issue: 06 Vol. 13; ISSN 1431-9276; ISSN applab
Publisher:
Microscopy Society of America (MSA)
Country of Publication:
United States
Language:
English

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