In situ etch rate measurements of thin film combinatorial libraries

Journal Article · Thu Nov 01 04:00:00 EDT 2007 · Applied Surface Science

DOI:https://doi.org/10.1016/j.apsusc.2007.05.094· OSTI ID:1344752

Perkins, J. D.; van Hest, M. F. A. M.; Teplin, C. W.; Dabney, M. S.; Ginley, D. S.

We demonstrate the use of optical reflection mapping as an in situ characterization tool to evaluate the corrosion rate of compositionally graded thin film combinatorial libraries coated with a commercial glass etching paste. A multi-channel fiber-optically coupled CCD-array-based spectrometer was used to collect a series of reflectance maps from 300 to 1000 nm versus time. The thin film interference oscillations in the measured reflection spectra have been fitted to determine the film thickness as a function of time and thereby the etch rate. Application of this technique to an In–Mo–O composition spread library is presented as an example.

• Research Organization: National Renewable Energy Lab. (NREL), Golden, CO (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC36-08GO28308
• OSTI ID: 1344752
• Report Number(s): NREL/JA--520-42605
• Journal Information: Applied Surface Science, Journal Name: Applied Surface Science Journal Issue: 3 Vol. 254; ISSN 0169-4332
• Publisher: Elsevier
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
36 MATERIALS SCIENCE
combinatorial material science
in situ measurements
sputtering
thin film