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Analysis of a planetary-rotation system for evaporated optical coatings

Journal Article · · Applied Optics
DOI:https://doi.org/10.1364/AO.55.008550· OSTI ID:1330097
 [1]
  1. Univ. of Rochester, Rochester, NY (United States); Laboratory for Laser Energetics, University of Rochester
The impact of planetary-design considerations for optical coating deposition is analyzed, including the ideal number of planets, variations in system performance, and the deviation of planet motion from the ideal. System capacity is maximized for four planets, although substrate size can significantly influence this result. Guidance is provided in the design of high-performance deposition systems based on the relative impact of different error modes. As a result, errors in planet mounting such that the planet surface is not perpendicular to its axis of rotation are particularly problematic, suggesting planetary design modifications would be appropriate.
Research Organization:
Univ. of Rochester, Rochester, NY (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
NA0001944
OSTI ID:
1330097
Alternate ID(s):
OSTI ID: 1329087
Journal Information:
Applied Optics, Journal Name: Applied Optics Journal Issue: 30 Vol. 55; ISSN APOPAI; ISSN 0003-6935
Publisher:
Optical Society of America (OSA)Copyright Statement
Country of Publication:
United States
Language:
English

References (5)

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Measurements of angular evaporation characteristics of sources
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  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 1, Issue 3 https://doi.org/10.1116/1.572030
journal July 1983
Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system journal January 2006
Optimization of thickness uniformity of optical coatings on a conical substrate in a planetary rotation system journal January 2013
Plasma-ion-assisted coatings for 15 femtosecond laser systems journal January 2014

Cited By (1)

Simulation and Optimization of Film Thickness Uniformity in Physical Vapor Deposition journal September 2018

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