Identifying electronic properties relevant to improving stability in a-Si:H-based cells and overall performance in a-Si,Ge:H-based cells. Annual subcontract report, April 18, 1994--April 17, 1995
- Oregon Univ., Eugene, OR (United States)
This report describes work performed by the University of Oregon focusing on the characterization and evaluation of amorphous semiconductor materials produced by novel deposition conditions and/or methods. The results are based on a variety of junction capacitance techniques: admittance spectroscopy, transient photocapacitance (and photocurrent), and drive-level capacitance profiling. These methods allow the determination of deep defect densities and their energy distributions, Urbach bandtail energies, and, in some cases, {mu}{tau} products for hole transport. During this phase, the authors completed several tasks: (1) they carried out measurements on a-Si, Ge:H alloy samples produced at Harvard University by a cathodic glow discharge process, measurement indicated a smaller value of ({mu}{tau}){sub h} for these samples than would have been expected given their lower defect densities; (2) they characterized several hot-wire a-Si:H samples produced with varying hydrogen levels, studies indicate that hot-wire-produced a-Si:H, with H levels between 2--5 at.% should lead to mid-gap devices with superior properties; (3) they reported some results on a-Si:H glow discharge material grown under hydrogen dilution conditions. Preliminary studies point to film strain as playing a primary role for the observed differences in behavior.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States); Oregon Univ., Eugene, OR (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC36-83CH10093
- OSTI ID:
- 132673
- Report Number(s):
- NREL/TP-451-20290; ON: DE96000467; TRN: AHC29529%%35
- Resource Relation:
- Other Information: PBD: Nov 1995
- Country of Publication:
- United States
- Language:
- English
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