Optimized ECR plasma apparatus with varied microwave window thickness

Patent · Tue Nov 14 00:00:00 EST 1995

OSTI ID:131911

Berry, L A

The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design. 9 figs.

• Research Organization: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
• DOE Contract Number: AC05-84OR21400
• Assignee: Sematech, Inc., Austin, TX (United States)
• Patent Number(s): US 5,466,991/A/
• Application Number: PAN: 8-340,140; CNN: Contract ERD-89-876; TRN: 96:004585
• OSTI ID: 131911
• Resource Relation: Other Information: PBD: 14 Nov 1995
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION
THERMONUCLEAR REACTORS
MICROWAVE EQUIPMENT
CONTROL
HIGH-FREQUENCY DISCHARGES
PLASMA PRODUCTION
MICROWAVE RADIATION
ELECTRON CYCLOTRON-RESONANCE