Chlorine-activated diamond CVD

Journal Article · Sat Apr 01 04:00:00 EST 1995 · High Temperature and Materials Science

OSTI ID:131746

Pan, C; Margrave, J L; Hauge, R H ^[1]

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1. Rice Univ., Houston, TX (United States). Dept. of Chemistry

A novel method of producing atomic hydrogen and the active carbon species necessary for diamond CVD has been demonstrated. This method starts with the generation of atomic chlorine from the thermal dissociation of molecular chlorine in a resistively heated graphite furnace at temperature from 1,300--1,500 C. Atomic hydrogen and the carbon precursors are subsequently produced through rapid hydrogen abstraction reactions of atomic chlorine with molecular hydrogen and hydrocarbons at the point where they mix. The quality of the diamond deposits has been found to depend on both substrate temperatures and H{sub 2}/C{sub 2} mole ratios. The effects of process parameters such as substrate and furnace temperatures, methane and chlorine flows, and system pressures on diamond growth rates have also been studied by an in situ Fizeau interferometer. The all carbon nature of the activation device and the low activation and deposition temperatures involved in chlorine-activated diamond CVD likely permit diamond depositions free of metal and nitrogen impurities.

• OSTI ID: 131746
• Report Number(s): CONF-9404290--
• Journal Information: High Temperature and Materials Science, Journal Name: High Temperature and Materials Science Journal Issue: 2-3 Vol. 33; ISSN 1080-1278; ISSN XZ4289
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CATALYTIC EFFECTS
CHEMICAL ACTIVATION
CHEMICAL VAPOR DEPOSITION
CHLORINE
CRYSTAL GROWTH
DIAMONDS
DISSOCIATION
METHANE
PARAMETRIC ANALYSIS