Direct Release of Sombrero-Shaped Magnetite Nanoparticles via Nanoimprint Lithography

Journal Article · Sat Jan 10 00:00:00 EST 2015 · Advanced Materials Interfaces

DOI:https://doi.org/10.1002/admi.201400511· OSTI ID:1287491

Kwon, Byung Seok ^[1]; Zhang, Wei ^[2]; Li, Zheng ^[1]; Krishnan, Kannan M. ^[1]

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1. Department of Materials Science and Engineering, University of Washington, Seattle WA 98195 USA
2. Argonne National Laboratory, Lemont IL 60439 USA

Magnetic nanoparticles produced via nanoimprint lithography can change the current paradigm of fabrication processes from chemical “bottom-up” synthesis to “top-down” fabrication. The combination of controlled nondirectional magnetron sputtering, ETFE mold, bilayer lift-off, and dry etching release can control the shape, size, and structure of the fabricated nanoparticles. The resulting magnetic nanoparticles have a novel “sombrero” shape with complex and unique physical/magnetic properties.

• Research Organization: Argonne National Lab. (ANL), Argonne, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences and Engineering Division
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 1287491
• Journal Information: Advanced Materials Interfaces, Vol. 2, Issue 3; ISSN 2196-7350
• Publisher: Wiley-VCH
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY